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227-0118-00L 4 Credits
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Microsystem Technology

Microsystems Technology

VVZ CR n/a

Last Updated: 2026-02-05 15:02:50

Abstract

Students are introduced to the basics of micromachining and silicon process technology and will learn about the fabrication of microsystems and -devices by a sequence of defined processing steps (process flow).

Objective

Students are introduced to the basics of micromachining and silicon process technology and will understand the fabrication of microsystem devices by the combination of unit process steps ( = process flow).

Content

- Introduction to microsystems technology (MST) and micro electro mechanical systems (MEMS) - Basic silicon technologies: Thermal oxidation, photolithography and etching, diffusion and ion implantation, thin film deposition. - Specific microsystems technologies: Bulk and surface micromachining, dry and wet etching, isotropic and anisotropic etching, beam and membrane formation, wafer bonding, thin film mechanical and thermal properties, piezoelectric and piezoresitive materials. - Selected microsystems: Mechanical sensors and actuators, microresonators, thermal sensors and actuators, system integration and encapsulation.

Resources

Lecture Notes

Handouts

Literature

- S.M. Sze: Semiconductor Devices, Physics and Technology. - W. Menz, J. Mohr, O. Paul: Microsystem Technology. - G. Kovacs: Micromachined Transducer Sourcebook.

General Information

Language
English
Frequency
Yearly recurring

Examination

Type
session examination
Mode
oral 30 minutes

Course Components

Type Title Time & Place Hours
lecture with exercise Microsystems Technology
  • Mon 13:15-17:00 (VAW B 1)
4 h weekly

Offered In