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327-2210-00L 5 Credits DR , MSC D-ITET , D-MATL , D-PHYS
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Thin Films Technology - From Fundamentals to Oxide Electronics

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Last Updated: 2026-06-01 11:30:56

Abstract

Oxide films with a thickness of just a few atoms can now be grown with a precision matching that of semiconductors. This opens up a whole world of functional device concepts and fascinating phenomena that would not occur in the expanded bulk crystal.We will give an introduction to thin films deposition techniques and applications with a focus on the growth of multifunctional oxide thin films.

Objective

In this course students will obtain an overarching view on thin film deposition techniques with a focus on epitaxial deposition processes. The main learning objectives are: - Identification of most relevant deposition technique for a given application. - Understanding of growth mechanism and growth modes. - Understanding strategies for engineering the functionalities of the films using the deposition process. - Selection of the most appropriate characterization technique. - Understanding device concepts and fundamental limits in the technology relevant ultra-thin limit. - Assessing the relevance of scientific literature dealing with complex oxide thin films.

Content

A lab visit visit will be organized and students will participate to the design of thin films with atomic precision. General description of the leading deposition routes including physical and chemical vapor deposition techniques (PVD and CVD) as well as so called "wet techniques" (e.g. spin coating and spray pyrolysis). Growth modes and processes. Part of the course discusses vacuum technologies. Fundamental characterization techniques for application-relevant thin films as well as state of the art approaches for in situ and ex-situ determination of the structural, chemical and ferroic (ferromagnetic and ferroelectric) properties of films: (XRD for thin films, RHEED, EDX, scanning probe microscopy techniques, laser-optical characterization and many more) Epitaxy for the advanced design and characterization of high quality thin films for energy efficient oxide electronics. Types of ferroic order, multiferroics, mulitfiunctional oxide materials, epitaxial strain related effects, oxide thin film based devices and examples. Regular discussions on preselected scientific literature and mini-seminars will be organized.

General Information

Language
English
Levels
DR , MSC
Frequency
Yearly recurring

Examination

Type
end-of-semester examination
Mode
written 90 minutes
Aids
None
Regular presentations and discussion sessions will be organized to identify critical aspects of the scientific literature dealing with oxide thin films. Students will present in class the main results of pre-selected scientific publications within the context of the ongoing lectures. Students who complete all assignment (uploading their presentation slides) will benefit from a 0.25 Bonus on the final grade.

Course Components

Type Title Time & Place Hours
lecture with exercise Thin Films Technology - From Fundamentals to Oxide Electronics
  • Tue 15:45-17:30 (HIL E 8)
  • Thu 09:45-11:30 (HPT C 103)
4 h weekly

Offered In

      • Vertiefung: Electronics and Photonics (The core courses and specialisation courses below are a selection for students who wish to specialise in the area of "Electronics and Photonics", see . The individual study plan is subject to the tutor's approval.)
        • Vertiefungsfächer (These specialisation courses are particularly recommended for the area of "Electronics and Photonics", but you are free to choose courses from any other field in agreement with your tutor. Semester / Research Projects are not allowed in this category. A minimum of 40 credits must be obtained from specialisation courses during the Master's Programme.)
      • Allgemeine Wahlfächer (Den Studierenden steht das gesamte Lehrangebot der ETH Zürich zur individuellen Auswahl offen - mit folgenden Einschränkungen: Lehrveranstaltungen aus den ersten beiden Studienjahren eines Bachelor-Curriculums der ETH Zürich sowie Lehrveranstaltungen aus GESS "Wissenschaft im Kontext" sind nicht als allgemeines Wahlfach anrechenbar. Die Dozierenden folgender Lehrveranstaltungen empfehlen sie ausdrücklich den Studierenden der Physik. (Für die Lehrveranstaltungen in dieser Liste können Sie die Kategorie "Allgemeine Wahlfächer" direkt in myStudies zuordnen. Für die Kategoriezuordnung anderer zugelassener Lehrveranstaltungen lassen Sie bei der Prüfungsanmeldung "keine Kategorie" ausgewählt und wenden Sie sich nach dem Verfügen des Prüfungsresultates an das Studiensekretariat ( ).))
  • Doktorat Informationstechnologie und Elektrotechnik (A minimum of 12 ECTS credit points must be obtained during doctoral studies (also see sub-categories for details) More Information at )
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  • Doktorat Materialwissenschaft (Weitere Informationen unter: )