VVZ API is not affiliated with ETH Zurich. Data might be outdated or incorrect. Please view the official ETHZ Vorlesungsverzeichnis for binding information.

327-2210-00L 4 Credits DR , MSC D-MATL , D-ITET , D-PHYS
You're viewing possible stale or outdated data. Please check the latest semester for more up-to-date information.

Thin Films Technology - From Fundamentals to Oxide Electronics

Students who already took "327-2104-00L Inorganic Thin Films: Processing, Properties and Applications" AND "327-2132-00 Multifunctional Ferroic Materials: Growth and Characterisation" are not allowed to attend this course.
VVZ CR n/a

Last Updated: 2026-02-05 16:16:31

Abstract

We will give an introduction to thin films deposition techniques and applications with a focus on the growth of multifunctional oxide thin films. The leading deposition routes (PVD and CVD techniques) and characterization techniques for application-relevant thin films will be discussed. Emerging oxide electronics, materials selection and energy efficient device concepts will be introduced.

Objective

Oxide films with a thickness of just a few atoms can now be grown with a precision matching that of semiconductors. This opens up a whole world of functional device concepts and fascinating phenomena that would not occur in the expanded bulk crystal. Particularly interesting phenomena occur in films showing magnetic or electric order or, even better, both of these ("multiferroics"). In this course students will obtain an overarching view on thin film deposition techniques with a focus on epitaxial deposition processes. We will show how the thin film functionalities of the films can be engineering by the deposition process and present the state of the art for advanced characterization in the technology relevant ultra-thin limit. Students will therefore understand how to fabricate and characterize highly oriented films with magnetic and electric properties not found in nature.

Content

General description of the leading deposition routes including physical and chemical vapor deposition techniques (PVD and CVD) as well as so called "wet techniques" (e.g. spin coating and spray pyrolysis). Growth modes and processes. Part of the course discusses vacuum technologies. Fundamental characterization techniques for application-relevant thin films as well as state of the art approaches for in situ and ex-situ determination of the structural, chemical and ferroic (ferromagnetic and ferroelectric) properties of films: (XRD for thin films, RHEED, EDX, scanning probe microscopy techniques, laser-optical characterization and many more) Epitaxy for the advanced design and characterization of high quality thin films for energy efficient oxide electronics. Types of ferroic order, multiferroics, mulitfiunctional oxide materials, epitaxial strain related effects, oxide thin film based devices and examples.

General Information

Language
English
Levels
DR , MSC
Frequency
Yearly recurring

Examination

Type
end-of-semester examination
Mode
written 90 minutes
Aids
None

Course Components

Type Title Time & Place Hours
lecture with exercise Thin Films Technology - From Fundamentals to Oxide Electronics
  • Tue 15:45-17:30 (HCI D 8)
  • Thu 09:45-11:30 (HCI D 2)
  • 21.12 Date 09:45-11:30 (HCI G 3)
4 h weekly

Offered In